• iopq@lemmy.world
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    1 year ago

    Design? No

    Fabs? The advantage is insurmountable as long as the US keeps preventing ASML from exporting EUV to China

    • laylawashere44@lemmy.blahaj.zone
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      1 year ago

      Making a lithography machine that’s on par with ASML is just an engineering challenge. One that’s been solved once already by ASML, whose to say it can’t be solved again by someone else, especially if they can copy bits of the design.

      • iopq@lemmy.world
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        1 year ago

        It took them almost 20 years to make EUV machines that do it at scale. Canon and Nikon gave up on it.

        They also have many suppliers like Zeiss that may not be allowed to export to China, but I’m not sure about which ones are and which ones aren’t

        • laylawashere44@lemmy.blahaj.zone
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          1 year ago

          Things can be done a lot quickly if you are given an unlimited budget. Consider how quickly NASA got from nothing to landing on the moon, vs how long it is taking now with their much more limited budget.

          • iopq@lemmy.world
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            1 year ago

            Yes, but it was the “next thing” since research started in like the 1980s

            It’s actually harder to do than landing on the moon.

    • sndrtj@feddit.nl
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      1 year ago

      Yeah fuck that. As a Dutch citizen it should be up to our government to decide whether we let ASML export. But no, it’s got to be the Americans.